主要特點(diǎn)
Main feature
? Under the vacuum condition , a RF power supply acts on the rare gas in the vacuum chamber to form the plasma equivalent glow effect ( PECVD patent of our company ) , and the field energy of the plasma replaces the thermal energy , so that the growth temperature of the graphene is reduced , and the process conditions are improved .
該設(shè)備在真空條件下，通過射頻電源作用于真空腔室內(nèi)的稀薄氣體，形成等離子體等效輝光作用下（本公司PECVD），利用等離子體的場(chǎng)能部分代替了熱能，從而降低石墨烯生長(zhǎng)溫度，改善工藝條件。
? Achieve growth of high quality graphene thin films by controlling nucleation and growth of graphene
通過對(duì)石墨烯成核與生長(zhǎng)的調(diào)控實(shí)現(xiàn)高品質(zhì)石墨烯薄膜生長(zhǎng)
? In this method, copper foil is used as a base, motor drives copper foil to move under closed growth condition, and then it passes through the first temperature zone (annealed area). Graphene will deposit on the copper foil on the second, third temperature zone (growth area)ａnd tighten to the roll by the cooling device 該方法使用銅箔作為基底，電機(jī)帶動(dòng)銅箔在密閉生長(zhǎng)條件下運(yùn)動(dòng)，經(jīng)過溫區(qū)（退火區(qū)）處理后的銅箔；在第二、第三溫區(qū)（生長(zhǎng)區(qū)）石墨烯將沉積在銅箔上，并通過冷卻裝置后收緊成卷。
? With the advantages of rapid cooling and continuous growth, and can be used for large-scale growth of graphene with large area and high quality.
相對(duì)于現(xiàn)有技術(shù)具有快速冷卻、連續(xù)生長(zhǎng)的優(yōu)點(diǎn)，可以進(jìn)行大面積、高質(zhì)量石墨烯的規(guī)?；L(zhǎng)。
技術(shù)參數(shù)
| 輸入電源 | · Furnace input AC 208-240V ，50/60 Hz 輸入電壓 110V/220V 50/60 HZ |
| Power 功率 | 6KW |
| Working Temperature 工作溫度 | · Max. Temperature: 1200 °C (< 1 hr) Z高溫度：1200℃(< 1 hr) · Continuous working temperature: 1100 °C 持續(xù)工作溫度：1100℃ |
| Heating Zone 加熱區(qū) | · Heating Zone Length: 7.87" ( 200+200+200mm) 加熱區(qū)長(zhǎng)度：7.87”( 200+200+200mm) · Constant Temperature Zone: 15.74 " (400mm. +/- 1oC ) 恒溫區(qū)長(zhǎng)度：15.74 " (400mm. +/- 1oC ) |
| Heating Elements 加熱元件 | · Fe-Cr-Al Alloy doped by Mo 電阻絲（摻鉬鐵鉻鋁合金） |
| Processing Tube 爐管 | · High purity quartz tube: 100 mm OD x 1700 mm Length 石英管：100（外徑）*1700（長(zhǎng)）mm |
| Copper foil width 銅箔基底寬度 | ≤80mm |
| Copper foil running rate 銅箔前行速度 | 8cm/min---50cm/min 可調(diào) Adjustable |
| RF Signal frequency 射頻信號(hào)頻率 | 13.56MHz±0.005%W |
| Power output 功率輸出范圍 | 0-500W |
| Vacuum Dgree 真空度 | 10-1Pa |
| Dimensions 尺寸 | 280*60*130cm |
| Warranty 質(zhì)保 | One year limited warranty with lifetime support (Consumable parts such as processing tubes, and O-rings are not covered by the warranty, please order replacements at related products below.) 一年質(zhì)保終身支持（消耗品如爐管，O型圈不在質(zhì)保范圍內(nèi)） |
| Application Note 應(yīng)用 | · Equipped with high precision mass flowmeter in the gas system,can control the gas flow 氣路系統(tǒng)內(nèi)部裝有高精度質(zhì)量流量計(jì)可準(zhǔn)確的控制氣體流量 · Gas can mix sufficient in required proportion in the static mixing chamber, 設(shè)靜態(tài)混氣室，有助于氣體充分混合，按要求配比 · Can match R-T-R laminating & stripping equipment as below: 配套石墨烯卷對(duì)卷覆膜、剝離設(shè)備如下圖
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| Details 細(xì)節(jié)圖片 | · Overall structure 整體結(jié)構(gòu)
· District 分區(qū)
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